• Confirmed Invited Speakers

    Liping Zhang, IMEC The challenges and approaches in advanced Fin patterning
    Erwin Kessels, Eindhoven Univ. of Technology Plasma-based ALD and ALE for selective deposition
    Aziz Abdulagatov, University of Colorado Boulder Thermal Atomic Layer Etching of Si and Silicon-Containing Materials
    Scott Walton, Naval Research Electron Beam Generated Plasmas: Controlling the Flux for Atomic Layer Processing
    Cécile jenny, ST Microelectronics Etch Challenges in More than Moore applications
  • Registration
    39 chemin du vieux chêne
    38240 Meylan
    Tel: +33 825 595 525 (0,15€/min*)
    Fax: +33 4 38 38 18 19
    Information desk
    monday to friday from 2pm to 5pm
    17 Rue des Martyrs
    38054 Grenoble Cedex
    +33 438 782 921
    Sébastien BARNOLA

    (*) Prices starting from fixed line incumbent, a surcharge may be applied by operators, counting the second after the first 45 seconds.

    According to France's Personal Data Privacy Act in effect since June 2004, you may send a request in writing to INSIGHT OUTSIDE 39 chemin du vieux chêne, 38240 Meylan / France, or by email webmaster@insight-outside.fr to access your file in order to consult, modify and/or delete your personal information.

    © 2005 - 2023 Insight Outside