• Confirmed Invited Speakers

    Liping Zhang, IMEC The challenges and approaches in advanced Fin patterning
    Erwin Kessels, Eindhoven Univ. of Technology Plasma-based ALD and ALE for selective deposition
    Aziz Abdulagatov, University of Colorado Boulder Thermal Atomic Layer Etching of Si and Silicon-Containing Materials
    Scott Walton, Naval Research Electron Beam Generated Plasmas: Controlling the Flux for Atomic Layer Processing
    Cécile jenny, ST Microelectronics Etch Challenges in More than Moore applications
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