• Scope of the Workshop

    This workshop is the 11th in a series devoted to plasma etch and strip processes for micro, nano and bio- technologies. This year’s workshop also addresses new and challenging topics in the field of emerging nanoscale devices such as MEMS/NEMS, optronics devices and 3D Integration. The workshop will also be open to new topics like plasma for biotechnology.

    The objective of the workshop is to provide a forum for open discussions between science and industrial application. It is dedicated to scientists, process engineers and Ph-D students. Topics include both fundamental and applied research, as well as issues related to introduction into manufacturing, with the progressive downscaling of device dimensions and the simultaneous demand for more functionality.

    Invited talks will be given by scientific and technical leaders in each of the key areas to present the current state-of-the-art and to stimulate technical discussions.
  • Key dates

     
     
      
    Opening for registration
    January 2, 2019
      
    Abstracts are due
    February 28, 2019
      
    Notification of authors
    March 29, 2019

     
  • Registration
    INSIGHT OUTSIDE
    39 chemin du vieux chêne
    38240 Meylan
    Tel: +33 825 595 525 (0,15€/min*)
    Fax: +33 4 38 38 18 19
    Information desk
    monday to friday from 2pm to 5pm
    Organization
    CEA-Leti
    17 Rue des Martyrs
    38054 Grenoble Cedex
    +33 438 782 921
    Sébastien BARNOLA
     

    (*) Prices starting from fixed line incumbent, a surcharge may be applied by operators, counting the second after the first 45 seconds.

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